| 型號5000E大面積光刻機用于基板和顯示器
OAI 5000E型大面積掩光刻機是***種的高性能，全自動掩模對準器和曝光工具，可為大型平板應用提供超精密，，亞微米對準和分辨率。 其靈活的設計允許在各種基材（圓形或方形）上印刷高達300mm或20“×20”。 曝光系統兼容近，中，或深紫外范圍的光刻膠，并具有計算機控制的LED顯微鏡照明，在不太理想的觀察環境中觀察。
Model 5000E Large Area Mask Aligner for Substrates ａnd Displays
The OAI Model 5000E Large Area Mask Aligner is an advanced, high-performance, fully-automated mask Aligner ａnd exposure tool that delivers ultra precise, Topside, sub-micron alignment ａnd resolution for large, flat panel applications. Its flexible design allows printing on various substrates - round or square - up to 300mm or 20”x20”. The exposure system is compatible with photo resist in Near, Mid, or Deep UV range, ａnd features computer-controlled LED microscope lighting for viewing in less-than-ideal viewing environments. |
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